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Mathematical Modeling of the void evolution dynamics under the action of electromigration and cappilary forces in thin interconnects
by
Emre Ersin Ören
Metallurgical Materials Engineering Department, METU
Coauthors: Tarik Ogurtani(Metallurgical Materials Engineering Department, METU)
Extensive computer simulation experiments have been performed on the configurational changes associated with voids during the intragranual motions in two-dimensional space, utilizing various initial void morphologies with and without diffusional anisotropy. As a result, in addition to the wedge shape or slit formations, very rich and also unusual void morphological variations such as fragmentations or dendritic growth have been obtained. In these numerical experiments which shows excellent agreement with SEM and/or TEM studies reported in the literature, the Euler's method of finite differences with an automatic time step self-adjustment has been utilized in combination with a rather powerful and fast boundary element method (BEM) for the solution of the Laplace equation.
Date received: February 12, 2001
Copyright © 2001 by the author(s). The author(s) of this document and the organizers of the conference have granted their consent to include this abstract in Atlas Conferences Inc. Document # cagk-38.